PM120L/PM180L plasma processor
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| Number | Content | Specification Parameters |
|---|---|---|
| 1 | Machine specifications | PM120L: 1320(W)×1720(H)×1030(D)mm PM180L: 1400(W)×1720(H)×1050(D)mm |
| 2 | Vacuum Chamber Specifications | 550(W)×635(H)×535(D)mm |
| 3 | Electrode Specifications | PM120L: 10-layer flat electrode plate (470(W)×410(D)mm) can be customized PM180L: 10-layer flat electrode plate (530(L)×400(W)mm) can be customized |
| 4 | Control System | Touch screen + PLC control |
| 5 | Vacuum measurement system | Pirani resistance vacuum gauge |
| 6 | Gas Metering System | Accurate mass flow controller MFC |
| 7 | Number of gas channels | 2-5 working gases are optional: Ar2, N2, H2, CF4, O2 |
| 8 | Plasma generator | 500W&1KW plasma source, 40KHz (optional 13.56MHz) |
| 9 | Working gas | 2 working gases are optional: Ar2, N2, H2, O2 |
| Features: High precision, fast response, good handling and compatibility, perfect functions and professional technical support. Uses: Suitable for camera and industry, mobile phone manufacturing, semiconductor IC field, silicone, plastic, polymer field, automotive electronics industry, aviation industry, etc. 1. Camera and fingerprint identification industry: deoxidize the gold PAD surface of soft and hard board; IR surface cleaning and cleaning; 2. Semiconductor IC field: COB, COG, COF, ACF process, used for cleaning before bonding and welding; 3. Silica gel, plastic, and polymer fields: surface roughening, etching, and activation of silica gel, plastic, and polymers. |
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